A Model for the Galvanostatic Deposition of Nickel Hydroxide
نویسندگان
چکیده
منابع مشابه
A Model for the Galvanostatic Deposition of Nickel Hydroxide
A mathematical model is presented for the galvanostatic deposition of Ni(OH)2 films in stagnant Ni(NO,), solutions. The objective is to quantify the anomalous deposition behavior reported previously in which the utilization of the electrochemically generated OW species decreased drastically as the concentration of Ni(N03)2 increased beyond 0.1 M. For example, as the Ni(NO,)2 concentration incre...
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ژورنال
عنوان ژورنال: Journal of The Electrochemical Society
سال: 1996
ISSN: 0013-4651,1945-7111
DOI: 10.1149/1.1837000